| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a pattern inspection method for further improving the accuracy of a reference image forming model. <P>SOLUTION: This pattern inspection method includes a process (S102) of inputting sample optical image data and design image data and acquiring a plurality of coefficients of a reference image forming model function; a process (S108) of comparing reference image data prepared using one of the plurality of coefficients with actual optical image data of a sample to be inspected and detecting a defect candidate pattern; a process (S112) of comparing, regarding reference image data including the defect candidate pattern, the reference image data corresponding to the remaining prepared coefficients with the actual optical image data including the defect candidate pattern using the remaining coefficients; and a process (S120) of outputting the comparison result establishing a predetermined condition, from among a plurality of comparison results between the reference image data, corresponding to the plurality of coefficients and the actual optical image data including the defect candidate pattern. <P>COPYRIGHT: (C)2010,JPO&INPIT</p> |
