| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a substrate inspection method and device for accurately detecting flaws or foreigns matter on a substrate. <P>SOLUTION: A mask 1 is irradiated with light from a light source 2, and an optical image is obtained by detectors 10, 13. A detector 203 detects the amount of refractive index change around the mask 1, and a positional information section 17 forms position correction data, based on data from a length measuring section 16 and data relating to the amount of refractive index change from the detector 203. A comparison section 18 compares the optical image from the detectors 10, 13 and a reference image from a reference section 19, based on the positional correction data. <P>COPYRIGHT: (C)2010,JPO&INPIT</p> |
