发明名称 DUAL GATE LATERAL DIFFUSED MOS TRANSISTOR
摘要 A disclosed power transistor, suitable for use in a switch mode converter that is operable with a switching frequency exceeding, for example, 5 MHz or more, includes a gate dielectric layer overlying an upper surface of a semiconductor substrate and first and second gate electrodes overlying the gate dielectric layer. The first gate electrode is laterally positioned overlying a first region of the substrate. The first substrate region has a first type of doping, which may be either n-type or p-type. A second gate electrode of the power transistor overlies the gate dielectric and is laterally positioned over a second region of the substrate. The second substrate region has a second doping type that is different than the first type. The transistor further includes a drift region located within the substrate in close proximity to an upper surface of the substrate and laterally positioned between the first and second substrate regions.
申请公布号 US2009244928(A1) 申请公布日期 2009.10.01
申请号 US20080060105 申请日期 2008.03.31
申请人 YANG HONGNING;ZUO JIANG-KAI 发明人 YANG HONGNING;ZUO JIANG-KAI
分类号 H02M3/335;H01L21/822;H01L27/088 主分类号 H02M3/335
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