发明名称 DRILLED CVD SHOWER HEAD
摘要 A shower head for a chemical vapor deposition chamber can comprise a plurality of first injectors for a first reactant gas and a plurality of second injectors for a second reactant gas. The first and second injectors can be interspersed among one another so as to enhance control of the mixing and delivery of reactant gases within the chemical deposition chamber. Cooling water can be communicated through a plurality of gun drilled bores formed intermediate injectors of the shower head. In this manner, enhanced control of the mixing and delivery of reactant gases can be provided.
申请公布号 US2009241833(A1) 申请公布日期 2009.10.01
申请号 US20080165269 申请日期 2008.06.30
申请人 MOSHTAGH VAHID S;RAMER JEFFREY C 发明人 MOSHTAGH VAHID S.;RAMER JEFFREY C.
分类号 C23C16/00;B23P17/00;F28D15/00 主分类号 C23C16/00
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