| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a new polymeric compound that can be used as a base component of a positive resist composition, and to provide a positive resist composition containing the polymeric compound, and a method of forming a resist pattern using the positive resist composition. <P>SOLUTION: The positive resist composition contains a base component (A) which exhibits increased solubility in an alkali developing solution under action of an acid, and an acid generator component (B) which generates an acid upon exposure, wherein the base component (A) includes a polymeric compound (A1) containing a structural unit (a0) represented by general formula of -CH<SB>2</SB>C(R<SP>1</SP>)-[-C(=O)-O-A-C(=O)-O-B-C(=O)-O-R<SP>2</SP>]. In formula, R<SP>1</SP>represents a hydrogen atom, a lower alkyl group or a halogenated lower alkyl group; A represents a bivalent linking group; B represents a bivalent linking group; and R<SP>2</SP>represents an acid dissociable, dissolution inhibiting group. <P>COPYRIGHT: (C)2010,JPO&INPIT |
