| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a multi-gradation photomask which has a resist pattern having a desired remaining film value of thickness in a translucent area without reference to a pattern shape and a method of manufacturing the same, and a pattern transfer method. <P>SOLUTION: The multi-gradation photomask is provided with a light shielding area A, a first light-transluent area B (dark light-transluent area), a second light-transluent area C (light-transluent area), and a light-ttransluent area D on a transparent substrate 21. The first light-transluent area B has a pattern of a wide area, and the second light-transluent area C has a pattern including a narrow width. The first light-transluent area B and second light-transluent area C are different in film thickness, and nearly equal to effective transmissivity to exposure light. <P>COPYRIGHT: (C)2010,JPO&INPIT |
