| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a surface roughening and treating method for photosensitive film for roughening a surface of the photosensitive film efficiently and to provide the photosensitive film treated by this treating method. <P>SOLUTION: This surface roughening and treating method for the photosensitive film 2 comprises a laminating process for laminating the photosensitive film 2 formed on a transparent supporting body 1 on a base 3 to bring the photosensitive film 2 into contact with it, an exposing process for exposing the photosensitive film 2 laminated on a base 4 to light through the transparent supporting body 1, a developing process for peeling the transparent supporting body 1 off the photosensitive film 2 after exposure to light and developing the photosensitive film 2, and a surface roughening process for roughening the surface of the photosensitive film 2 after development. The surface roughening process is performed by, for example, plasma treatment. Preferably, a surface roughness Ra value of the photosensitive film 2 is 0.05-0.2 μm. <P>COPYRIGHT: (C)2010,JPO&INPIT |
