发明名称 IMMERSION SYSTEM, EXPOSURE APPARATUS, EXPOSING METHOD AND DEVICE FABRICATING METHOD
摘要 <p>An immersion system is used in an immersion exposure, wherein a substrate is exposed with an exposure light through an optical member and a liquid, and that fills an optical path of the exposure light between the optical member and the substrate with the liquid. The immersion system comprises: a first member, which is disposed around the optical path of the exposure light and has a first surface that faces in a first direction; a second member that has a liquid recovery port, which is disposed on the outer side of the first surface with respect to the optical path of the exposure light; a first drive apparatus that is capable of moving the first member parallel to the first direction; and a second drive apparatus that is capable of moving the second member parallel to the first direction independently of the first member; wherein, a space between the first surface and a front surface of an object can hold the liquid; and a liquid between the liquid recovery port and the front surface of the object is recovered via the liquid recovery port.</p>
申请公布号 WO2009119898(A1) 申请公布日期 2009.10.01
申请号 WO2009JP56843 申请日期 2009.03.26
申请人 NIKON CORPORATION;NISHII, YASUFUMI 发明人 NISHII, YASUFUMI
分类号 G03F7/20 主分类号 G03F7/20
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