| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To prevent uneven sensitivity and mixing of colors or the like to assure excellent optical characteristics in sensitivity, smear, and shading or the like by securing a large total margin for advancement in fine pixels in view of forming a gap-free and stable color filter pattern. <P>SOLUTION: A solid-state imaging apparatus 10 is provided with photoelectric converting elements 13 provided in the shape of a matrix on a semiconductor substrate 11 and a plurality of color filter layers 20 for different colors formed corresponding to the photoelectric converting elements 13. A green-color filter layer 20G having the highest rate in the total sum of the area occupying the imaging region is formed of double layers of a first green-color filter layer 21a as the lowest layer in the color filter layer 20 and a second green-color filter layer 21b as the highest layer. <P>COPYRIGHT: (C)2010,JPO&INPIT</p> |
