| 摘要 |
PROBLEM TO BE SOLVED: To provide a photosensitive composition with which a black matrix having excellent pattern precision and hardness is obtained by using nanoimprint lithography. SOLUTION: The photosensitive resin composition is characterized in that it includes a coloring agent of at least 10 mass% or more and a polymerizable monomer, and has viscosity of 3 to 50 mPa.s in the state containing essentially no solvent after drying. COPYRIGHT: (C)2010,JPO&INPIT
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