| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a method of manufacturing a stencil mask suitable for manufacturing a stencil mask for suppressing the influence of warpage of a thin film layer because of a conductive film. <P>SOLUTION: The method of manufacturing the stencil mask includes: a step of preparing a substrate having at least a supporting layer, an etching stopper layer provided on the supporting layer and a thin film layer provided on the etching stopper layer; a step of polishing the supporting layer of the substrate; a step of forming a through-hole pattern on the thin film layer of the substrate; a step of providing an opening on the supporting layer to form the opening into the supporting layer; and a step of forming a conductive layer on the entire surface of the substrate. <P>COPYRIGHT: (C)2010,JPO&INPIT</p> |
