发明名称 ELEMENT WAFER AND METHOD FOR MANUFACTURING THE SAME
摘要 PROBLEM TO BE SOLVED: To provide a method for manufacturing an element wafer capable of suppressing damage due to propagation of cracking to a film which is laminated on a semiconductor wafer for forming an element thereon. SOLUTION: A recessed portion 10 with an insulating film formed in a recessed shape so as to surround an actual region 6 is provided on the periphery of the actual region 6 where an acceleration sensor 20 is formed on a semiconductor wafer. The recessed portion suppresses propagation of cracking to the portion of the acceleration sensor 20. COPYRIGHT: (C)2010,JPO&INPIT
申请公布号 JP2009224577(A) 申请公布日期 2009.10.01
申请号 JP20080067786 申请日期 2008.03.17
申请人 MITSUBISHI ELECTRIC CORP 发明人 OKUMURA MIKA;HORIKAWA MAKIO;SATO KIMITOSHI;YAMAGUCHI YASUO
分类号 H01L29/84;B81B3/00;B81C1/00;H01L21/02 主分类号 H01L29/84
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