发明名称 |
ELEMENT WAFER AND METHOD FOR MANUFACTURING THE SAME |
摘要 |
PROBLEM TO BE SOLVED: To provide a method for manufacturing an element wafer capable of suppressing damage due to propagation of cracking to a film which is laminated on a semiconductor wafer for forming an element thereon. SOLUTION: A recessed portion 10 with an insulating film formed in a recessed shape so as to surround an actual region 6 is provided on the periphery of the actual region 6 where an acceleration sensor 20 is formed on a semiconductor wafer. The recessed portion suppresses propagation of cracking to the portion of the acceleration sensor 20. COPYRIGHT: (C)2010,JPO&INPIT
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申请公布号 |
JP2009224577(A) |
申请公布日期 |
2009.10.01 |
申请号 |
JP20080067786 |
申请日期 |
2008.03.17 |
申请人 |
MITSUBISHI ELECTRIC CORP |
发明人 |
OKUMURA MIKA;HORIKAWA MAKIO;SATO KIMITOSHI;YAMAGUCHI YASUO |
分类号 |
H01L29/84;B81B3/00;B81C1/00;H01L21/02 |
主分类号 |
H01L29/84 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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