| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a sputtering target which is composed of an oxide sintered compact, such as ITO, which reduces the occurrence of arcing and nodule, and is stable in the quality of a product. <P>SOLUTION: In the sputtering target composed of the oxide sintered compact, the arithmetic mean roughness (Ra) and maximum height roughness (Rz) of a region to be sputtered of the target and a crystal grain size (d) of the oxide sintered compact satisfy at least one formula described hereunder, and thereby the occurrence of the arcing and the nodule can be reduced:(1) 0.05 μm≤Rz(μm)≤d(μm)×0.2 formula; and (2) 0.4 μm≤Rz(μm)≤d(μm)×1.8 formula. <P>COPYRIGHT: (C)2010,JPO&INPIT |
