发明名称 |
SUBSTRATE TREATING APPARATUS AND SUBSTRATE TREATING METHOD |
摘要 |
A substrate treating apparatus for performing a predetermined treatment of substrates with a treating liquid. The apparatus includes a treating tank for storing the treating liquid; a lifter having holding elements for holding the substrates, and vertically movable between a standby position above the treating tank and a treating position inside the treating tank; lower nozzles arranged on opposite sides at a bottom of the treating tank for supplying the treating liquid; upper nozzles arranged above the lower nozzles for supplying the treating liquid toward the holding elements of the lifter; and a control device for controlling a flow ratio of the treating liquid between the upper nozzles and the lower nozzles according to the treatment.
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申请公布号 |
US2009242517(A1) |
申请公布日期 |
2009.10.01 |
申请号 |
US20090410049 |
申请日期 |
2009.03.24 |
申请人 |
FUJIWARA KUNIO;YOSHIDA JUNICHI |
发明人 |
FUJIWARA KUNIO;YOSHIDA JUNICHI |
分类号 |
B08B3/02;C03C15/00;C23F1/00 |
主分类号 |
B08B3/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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