发明名称 IMAGE DENSITY-ADAPTED AUTOMATIC MODE SWITCHABLE PATTERN CORRECTION SCHEME FOR WORKPIECE INSPECTION
摘要 An image correction device for use in a pattern inspection apparatus is disclosed, which has automatic adaptability to variations in density of a pattern image of a workpiece being tested. The device is operable to identify a two-dimensional (2D) linear predictive model parameters from the pattern image of interest and determine the value of a total sum of these identified parameters. This value is then used to switch between a corrected pattern image due to the 2D linear prediction modeling and a corrected image that is interpolated by bicubic interpolation techniques. A pattern inspection method using the image correction technique is also disclosed.
申请公布号 US2009245619(A1) 申请公布日期 2009.10.01
申请号 US20090482836 申请日期 2009.06.11
申请人 ADVANCED MASK INSPECTION TECHNOLOGY INC. 发明人 OAKI JUNJI;SUGIHARA SHINJI
分类号 G06K9/00;G01N21/956;G03F1/84;G06T1/00 主分类号 G06K9/00
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