发明名称 Semiconductor wafer, semiconductor device, and method of manufacturing semiconductor device
摘要 Provided is a semiconductor wafer with a scribe line region and a plurality of element forming regions partitioned by the scribe line region, the semiconductor wafer including: conductive patterns formed in the scribe line region; and an island-shaped passivation film formed above at least a conductive pattern, which is or may be exposed to a side surface of a semiconductor chip obtained by dicing the semiconductor wafer along the scribe line region, among the conductive patterns, so that the island-shaped passivation film is opposed to the conductive pattern.
申请公布号 US2009243044(A1) 申请公布日期 2009.10.01
申请号 US20090382540 申请日期 2009.03.18
申请人 NEC ELECTRONICS CORPORATION 发明人 TANAKA KOUJI;ISOZAKI SEIYA
分类号 H01L29/06;H01L21/78 主分类号 H01L29/06
代理机构 代理人
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