POLYMERS USEFUL IN PHOTORESIST COMPOSITIONS AND COMPOSITIONS THEREOF
摘要
<p>The present application relates to a polymer having the formula (I) where R30, R31, R32, R33, R40, R41, R42, jj, kk, mm, and nn are described herein. The compounds are useful in forming photoresist compositions.</p>
申请公布号
WO2008087549(A8)
申请公布日期
2009.10.01
申请号
WO2008IB00123
申请日期
2008.01.15
申请人
AZ ELECTRONIC MATERIALS USA CORP.
发明人
PADMANABAN, MUNIRATHNA;CHAKRAPANI, SRINIVASAN;DAMMEL, RALPH R.
