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发明名称
Lithographieapparat und Verfahren zum Aufbereiten eines Innenraums eines Gerätes zur Herstellung einer Halbleitervorrichtung
摘要
申请公布号
DE602006008549(D1)
申请公布日期
2009.10.01
申请号
DE200660008549T
申请日期
2006.09.29
申请人
ASML NETHERLANDS B.V.
发明人
VAN EMPEL, TJARKO ADRIAAN RUDOLF;VAN DER HAM, RONALD;ROSET, NIEK JACOBUS JOHANNES
分类号
G03F7/20
主分类号
G03F7/20
代理机构
代理人
主权项
地址
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