RADIATION-SENSITIVE COMPOSITION

摘要

PROBLEM TO BE SOLVED: To provide a radiation-sensitive composition which is suitably used as a chemically amplified resist useful for micromachining using various radiations.

SOLUTION: The radiation-sensitive composition contains: a calixarene type compound (A) with a specified structure; a polymer (B) containing a repeating unit with a tertiary carbon in a side chain and a repeating unit with a lactone structure; and a radiation-sensitive acid generator (C).

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