发明名称 POSITIVE RESIST COMPOSITION AND METHOD OF FORMING PATTERN USING THE SAME
摘要 <P>PROBLEM TO BE SOLVED: To provide a resist composition excellent in sensitivity, resolution, LER (line edge roughness), pattern features and outgas properties. <P>SOLUTION: The resist composition contains (A) a resin containing a repeating unit expressed by general formula (I) and (B) a compound expressed by general formula (II). In formulae, each note represents a predetermined element or group. <P>COPYRIGHT: (C)2010,JPO&INPIT
申请公布号 JP2009222937(A) 申请公布日期 2009.10.01
申请号 JP20080066743 申请日期 2008.03.14
申请人 FUJIFILM CORP 发明人 KAMIMURA SATOSHI
分类号 G03F7/039;C08F20/18;C08F212/14;H01L21/027 主分类号 G03F7/039
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