| 摘要 |
PROBLEM TO BE SOLVED: To provide a charged particle beam inspection apparatus that discovers abnormal conditions due to a stage in an early stage and takes a quick countermeasure. SOLUTION: In the charged particle beam inspection apparatus, a charged particle beam is irradiated while an inspected substrate arranged on a stage is continuously shifted, and an image is created based on a generated secondary signal. The apparatus includes a position monitor length measuring unit which measures a position of continuous shifts of the stage, a controlling circuit for calculating a speed from measured positions, and a display for displaying the measured positions and a time variation of the calculated speeds. COPYRIGHT: (C)2010,JPO&INPIT
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