发明名称 SUBSTRATE CLEANING DEVICE, SUBSTRATE CLEANING METHOD, AND STORAGE MEDIUM
摘要 <P>PROBLEM TO BE SOLVED: To improve productivity of a substrate, in a substrate cleaning device. Ž<P>SOLUTION: This substrate cleaning device 2 includes: a brush cleaner 5 which is arranged away from a position for cleaning a substrate 6 by a cleaning member 50, and of which the undersurface is formed as a cleaning surface contacting a brush part to clean the brush part; a moving means moving the cleaning member between a region for cleaning the substrate and a region for cleaning the brush part by the brush cleaner; a means pressing the brush part of the cleaning member against the undersurface of the brush cleaner, and relatively rotating the brush cleaner and the cleaning member; and a cleaning liquid supply means supplying a cleaning liquid between the undersurface of the brush cleaner and the brush part when the brush cleaner and the brush member are being relatively rotated. Ž<P>COPYRIGHT: (C)2010,JPO&INPIT Ž
申请公布号 JP2009224383(A) 申请公布日期 2009.10.01
申请号 JP20080064410 申请日期 2008.03.13
申请人 TOKYO ELECTRON LTD 发明人 NISHIKIDO SHUICHI;YOSHITAKA NAOTO;KITANO TAKAHIRO;TOKUNAGA YOICHI
分类号 H01L21/304;G02F1/13;G02F1/1333;H01L21/027 主分类号 H01L21/304
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