发明名称 |
SUBSTRATE CLEANING DEVICE, SUBSTRATE CLEANING METHOD, AND STORAGE MEDIUM |
摘要 |
<P>PROBLEM TO BE SOLVED: To improve productivity of a substrate, in a substrate cleaning device. Ž<P>SOLUTION: This substrate cleaning device 2 includes: a brush cleaner 5 which is arranged away from a position for cleaning a substrate 6 by a cleaning member 50, and of which the undersurface is formed as a cleaning surface contacting a brush part to clean the brush part; a moving means moving the cleaning member between a region for cleaning the substrate and a region for cleaning the brush part by the brush cleaner; a means pressing the brush part of the cleaning member against the undersurface of the brush cleaner, and relatively rotating the brush cleaner and the cleaning member; and a cleaning liquid supply means supplying a cleaning liquid between the undersurface of the brush cleaner and the brush part when the brush cleaner and the brush member are being relatively rotated. Ž<P>COPYRIGHT: (C)2010,JPO&INPIT Ž
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申请公布号 |
JP2009224383(A) |
申请公布日期 |
2009.10.01 |
申请号 |
JP20080064410 |
申请日期 |
2008.03.13 |
申请人 |
TOKYO ELECTRON LTD |
发明人 |
NISHIKIDO SHUICHI;YOSHITAKA NAOTO;KITANO TAKAHIRO;TOKUNAGA YOICHI |
分类号 |
H01L21/304;G02F1/13;G02F1/1333;H01L21/027 |
主分类号 |
H01L21/304 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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