发明名称 Modified Substrate and Process for Production Thereof
摘要 The present invention is characterized in that a base material comprises ester groups in the main chain and/or in the side chain(s), and comprises a polymer having hydrophobic groups. Particularly, the hydrophobic groups can be introduced by irradiating the base material with a radiation during the base material contacts an aqueous solution of a monohydric alcohol or an aqueous solution of an alcohol having not less than 2 hydroxyl groups, which is a monomer or a polymer, and which has one or more carbon atoms between the carbon atoms to each of which the hydroxyl group is bound in the monomer or in each monomer constituting the polymer.
申请公布号 US2009242477(A1) 申请公布日期 2009.10.01
申请号 US20060887385 申请日期 2006.03.28
申请人 ARAKI MIHO;UENO YOSHIYUKI;SUGAYA HIROYUKI 发明人 ARAKI MIHO;UENO YOSHIYUKI;SUGAYA HIROYUKI
分类号 C08J7/00;A61L2/08;A61M1/18;B01D69/08;B01D71/40 主分类号 C08J7/00
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