| 摘要 |
PROBLEM TO BE SOLVED: To provide a composition that selectively removes a residues such as a photoresist, and also processes the residue from a substrate without non-desirably attacking an inductive material with a high dielectric constant, an inductive material with a low dielectric constant that can be exposed to the composition, and/or a metal region within a range. SOLUTION: The composition comprises one or more kinds water soluble organic solvents comprising glycol ether, water, a fluoride containing compound conditioned on that when the fluoride containing compound is ammonium fluoride, no additional fluoride containing compound is added to the composition, and an optional quaternary ammonium compound, and is used to remove the residue. COPYRIGHT: (C)2010,JPO&INPIT |
