| 摘要 |
PROBLEM TO BE SOLVED: To provide a plasma treatment device allowing a treatment chamber to be efficiently maintained. SOLUTION: This plasma treatment device 1 includes: a treatment chamber 11 having a lower chamber 12 and an upper chamber 13; a base 20 whereupon a silicon substrate K is to be mounted; a treatment gas supply device 27; a coil 32; a high-frequency power supply 33 for the coil; a lifting plate 41 which has a through-hole 41a and is vertically-movably arranged; a lifting mechanism 42 which supports and vertically moves the lifting plate 41; and a fixing mechanism 46 for fixing the upper chamber 13. The fixing mechanism 46 includes: a fixing plate 47; the fixing plate 47 and first fixing bolts 48, 49 for connecting and fixing a top plate 16 and the lifting plate 41 to each other by the fixing plate 47; a second fixing bolt 50 for fixing a flange section 32b of the holding member 32 and an annular plate 14 to each other; and a third fixing bolt 51 for fixing the annular plate 14 and a sidewall 12a of the lower chamber 12 to each other. COPYRIGHT: (C)2010,JPO&INPIT
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