METHOD FOR FILM FORMATION, APPARATUS FOR FILM FORMATION, AND COMPUTER-READABLE RECORDING MEDIUM
摘要
<p>Disclosed is a method for film formation, characterized by comprising allowing a treatment gas stream containing a metal carbonyl-containing treatment gas and a carbon monoxide-containing carrier gas to flow into a region on the upper outside of the outer periphery of a substrate to be treated in a diameter direction of the substrate while avoiding the surface of the substrate and diffusing the metal carbonyl from the treatment gas stream into the surface of the substrate to form a metal film on the surface of the substrate.</p>
申请公布号
WO2009119147(A1)
申请公布日期
2009.10.01
申请号
WO2009JP51088
申请日期
2009.01.23
申请人
TOKYO ELECTRON LIMITED;HARA, MASAMICHI;MIZUSAWA, YASUSHI;TAGA, SATOSHI;GOMI, ATSUSHI;HATANO, TATSUO