| 摘要 |
Fabrication of LCD device, comprises forming ohmic contact layer on active layer; forming a data line, a data pad, and source and drain electrodes on the ohmic contact layer; forming a pixel electrode contacting the drain electrode; forming a passivation layer on the substrate (100) including the pixel electrode; forming a common electrode on a second substrate; and injecting liquid crystal material between the substrates. Fabrication of LCD device, comprises: (A) forming a gate line (112), a gate pad, and a gate electrode (114) on a first substrate; (B) forming a gate insulating layer (116) on the gate line, the gate electrode, and the gate pad; (C) forming an active layer on the gate insulating layer; (D) forming an ohmic contact layer on the active layer; (E) forming a data line, a data pad, and source and drain electrodes on the ohmic contact layer; (F) forming a pixel electrode contacting the drain electrode; (G) forming a passivation layer on the substrate including the pixel electrode; (H) forming a common electrode on a second substrate; (I) attaching the first and second substrates such that the pixel electrode and the common electrode are facing into each other; (J) injecting a liquid crystal material between the first and second substrates; and (K) exposing the gate pad and the data pad without forming contact holes. An independent claim is also included for fabricating an array substrate for a liquid crystal display device, comprising forming a gate line, a gate pad, and a gate electrode on a substrate; forming a gate insulating layer on the gate line, the gate electrode, and the gate pad; forming an active layer on the gate insulating layer; forming an ohmic contact layer on the active layer; forming a data line, a data pad, and source and drain electrodes on the ohmic contact layer; forming a pixel electrode contacting the drain electrode; forming a passivation layer on the substrate including the pixel electrode; and exposing the gate pad and the data pad without forming contact holes. |
