BEAM PROCESSING APPARATUS, BEAM PROCESSING METHOD, AND BEAM PROCESSING SUBSTRATE

摘要

Disclosed is a beam processing apparatus that processes a layer to be processed (3) formed on one surface of a substrate (2), by irradiating the same with a beam. The beam processing apparatus comprises: a gas floating mechanism (10) that emits gas to support the substrate so as to float in a flat position; and a beam irradiating means (50) that processes the layer to be processed (3), formed on one surface of the substrate (2), by irradiating the same with a beam. The substrate (2) is arranged above the gas floating mechanism (10) so that the layer to be processed (3) formed on one surface of the substrate (2) is facing downwards. Processing is carried out on the layer to be processed (3) by emitting a beam through the substrate (2) and onto the layer to be processed (3) using the beam irradiating means (50) from above the other side of the substrate (2).