发明名称 |
METHOD OF FORMING A POROUS INSULATION FILM |
摘要 |
A method of forming a porous insulation film uses an organic silica material gas having a 3-membered SiO cyclic structure and a 4-membered SiO cyclic structure, or an organic silica material gas having a 3-membered SiO cyclic structure and a straight-chain organic silica structure, and uses a plasma reaction in the filming process. A porous interlevel dielectric film having a higher strength and a higher adhesive property can be obtained.
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申请公布号 |
US2009246538(A1) |
申请公布日期 |
2009.10.01 |
申请号 |
US20070374390 |
申请日期 |
2007.07.23 |
申请人 |
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发明人 |
YAMAMOTO HIRONORI;ITO FUMINORI;TADA MUNEHIRO;HAYASHI YOSHIHIRO |
分类号 |
B32B9/00;C07F7/21;H01L21/312 |
主分类号 |
B32B9/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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