| 摘要 |
<p>PURPOSE: An apparatus for immersion lithography is provided to prevent leak of water and remove easily the water before/after alignment. CONSTITUTION: The apparatus for immersion lithography includes the case(890) with the wafer stage, the exposer, the lens(820), and the dipping hood. The wafer stage moves the wafer(880). The exposer scans the light for minute circuit pattern to a wafer. The lens delivers the power of an exposer to the wafer. The dipping hood is installed on the surrounding of the lens. The dipping hood includes the air curtain(860) which controls the flow of the water. The air gun is mounted in the dipping hood. The air gun removes the water which flows to the outside of the dipping hood.</p> |
