Novel photoacid generator, resist composition, and patterning process

摘要

Photoacid generators generate sulfonic acids of formula (1a) upon exposure to high-energy radiation.
€ƒ€ƒ€ƒ€ƒ€ƒ€ƒ€ƒ€ƒROC(=O)R 1 -COOCH 2 CF 2 SO 3 - H + €ƒ€ƒ€ƒ€ƒ€ƒ(1a)
RO is OH or C 1 -C 20 organoxy, R 1 is a divalent C 1 -C 20 aliphatic group or forms a cyclic structure with RO. The photoacid generators are compatible with resins and can control acid diffusion and are thus suited for use in chemically amplified resist compositions.