| 摘要 |
<p>A drying system using a solvent vapor, wherein a method and apparatus for drying are provided, which can suppress occurrence of uneven drying. A drying apparatus (20) comprises a supply unit (52) which supplies hot air containing vapor of a second solvent onto a support 16 containing a first solvent and being conveyed, the second solvent having a smaller molecular volume than the molecular volume of the first solvent; exhaust outlets (58A, 58B) disposed at upstream and downstream of a supply unit (52) with respect to the conveying direction of the support 16; and windshield plates (60A, 60B) disposed between the exhaust outlets (58A, 58B) and the supply unit (52), with a predetermined gap from the support (16).</p> |
