发明名称 ANISOTROPIC SILICON ETCHANT COMPOSITION
摘要 <p>An etchant composition contains (a) an alkaline compound mixture of an organic alkaline compound and inorganic alkaline compound and (b) a silicon- containing compound. The organic alkaline compound is composed of one or more ingredients from quaternary ammonium hydroxide and ethylenediamine. The inorganic alkaline compound is composed of one or more ingredients from sodium hydroxide, potassium hydroxide, ammonia and hydrazine. The silicon- containing inorganic compound is composed of one or more ingredients from metal silicon, fumed silica, colloidal silica, silica gel, silica sol, diatomaceous earth, acid clay and activated clay, and the silicon- containing organic compound is composed of one or more ingredients from quaternary ammonium salts of alkyl silicate and quaternary ammonium salts of alkyl silicic acid.</p>
申请公布号 SG155148(A1) 申请公布日期 2009.09.30
申请号 SG20090013806 申请日期 2009.02.26
申请人 HAYASHI PURE CHEMICAL IND, LTD.;SANYO ELECTRIC CO., LTD.;SANYO SEMICONDUCTOR CO., LTD.;SANYO SEMICONDUCTOR MANUFACTURING CO., LTD. 发明人 ISAMI KENJI;KIMURA MAYUMI;AOYAMA TETSUO;TAGO TSUGUHIRO
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