发明名称 SYSTEM, APPARATUS, AND METHOD FOR GENERATING FORCE BY INTRODUCING A CONTROLLED PLASMA ENVIRONMENT INTO AN ASYMMETRIC CAPACITOR
摘要 <p>The present invention provides method, apparatus, and system that generates and uses a motive and other force by introducing a plasma environment into an asymmetric capacitor, resulting in a significant gain in force. This extraordinary increase in force allows the use of ionic motive and other forces to enter the realistic and practical application realm. In one embodiment, the energy field is energized by applying a system to increase a plasma density by ionizing the plasma environment in the energy field through electromagnetic radiation, by increasing the plasma temperature, or some combination thereof. In one embodiment, the invention also generates a flow of energy or plasma directed outward from the apparatus. The present invention can also provide the motive forces at substantially reduced voltage levels. The low voltage can reduce or eliminate negative effects the prior high voltage levels required to energize the asymmetric capacitor.</p>
申请公布号 SG155244(A1) 申请公布日期 2009.09.30
申请号 SG20090056342 申请日期 2005.05.24
申请人 ROBERT CHRYSLER BRENNAN, TRUSTEE FOR SDI TECHNOLOG 发明人 BRENNAN, ROBERT, CHRYSLER;PENNY, L., STUART;HIGMAN, KUMIKO, ISO
分类号 H02J1/00;H02N1/00 主分类号 H02J1/00
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