ABSORBING COMPOUNDS FOR SPIN-ON-GLASS ANTI-REFLECTIVE COATINGS FOR PHOTOLITHOGRAPHY

摘要

AN ABSORBING ETHER-LIKE COMPOUND INCLUDING A SILICONETHOXY, SILICONDIETHOXY OR SILICONTRIETHOXY SPECIES ATTACHED TO A NAPHTHALENE OR ANTHRACENE CHROMOPHORE VIA AN OXYGEN LINKAGE IS USED AS AN ORGANIC LIGHT-ABSORBING COMPOUND. THE ABSORBING ETHER-LIKE COMPOUND IS INCORPORATED INTO SPIN-ON GLASS MATERIALS TO PROVIDE ANTI-REFLECTIVE COATING MATERIALS FOR DEEP ULTRAVIOLET PHOTOLITHOGRAPHY. A METHOD OF SYNTHESIZING THE LIGHT-ABSORBING ETHER COMPOUNDS IS BASED ON THE REACTION OF AN ALCOHOL-SUBSTITUTED CHROMOPHORE WITH AN ACETOXYSILICON COMPOUND IN THE PRESENCE OF ALCOHOL. A METHOD OF MAKING ABSORBING SPIN-ON-GLASS MATERIALS INCLUDING THE ABSORBING ETHER-LIKE COMPOUNDS IS ALSO PROVIDED.