| 摘要 |
A POLISHING COMPOSITION TO BE USED FOR POLISHING A MAGNETIC DISK SUBSTRATE, WHICH COMPRISES (A) AT LEAST ONE MEMBER SELECTED FROM THE GROUP CONSISTING OF FORMIC ACID, ACETIC ACID, SUCCINIC ACID, MALIC ACID, MALEIC ACID, MALONIC ACID, BUTYRIC ACID, OXALIC ACID, IMINODIACETIC ACID, DL-MANDELIC ACID AND 1-GLUTAMIC ACID SALT, (B) SILICA AND (C) WATER, AND CONTAINS NO (D) AN OXIDANT
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