| 摘要 |
PURPOSE: A substrate treating apparatus and substrate treating method are provided to perform appropriate processing in response to the state of the processing liquid. CONSTITUTION: The substrate treating apparatus includes the process bath(1), the process solution supply unit, the processing liquid discharging unit, the first storage device, the second storage device, and the control unit. The process bath stores the processing liquid. The processing liquid discharging unit discharges the processing liquid from the process bath. The first and second storage device performs all liquid exchange and remembers the life count. The control unit performs partially liquid exchange as it usually reaches the life count.
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