| 摘要 |
PURPOSE: A chemical supply device is provided to prevent the chemical property of the chemical supplied to a process chamber or process tank from being changed by preventing the heat from being transmitted to the chemical supply pipe. CONSTITUTION: A chemical supply device includes an inert gas supply pipe(10), a chemical supply pipe(20), a chemical storage tank(30), a heater(50), and a heat transmission preventing unit(70). The inert gas supply pipe supplies the inert gas. The chemical supply pipe supplies the chemical. The tank stores the chemical in an inner space. The heat transmission preventing unit prevents the heat on the chemical supply pipe from being transmitted to the flow direction of the chemical.
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