发明名称 Method for forming a coating film on a facet of a semiconductor laser diode
摘要 The present invention is to provide a method for producing a semiconductor laser diode (LD) with an enhanced ESD resistance. The method includes a step for forming an aluminum film on a facet of the LD and a step for forming an aluminum oxide film on the aluminum film. The underlying aluminum film is oxidized during the formation of the aluminum oxide film to form a double aluminum oxide layer. The ratio of the oxide composition of the underlying aluminum oxide film is smaller than that of the upper aluminum oxide film.
申请公布号 US7596162(B2) 申请公布日期 2009.09.29
申请号 US20070896457 申请日期 2007.08.31
申请人 SUMITOMO ELECTRIC INDUSTRIES LTD. 发明人 FUKUDA CHIE;ICHIKAWA HIROYUKI
分类号 H01S5/00 主分类号 H01S5/00
代理机构 代理人
主权项
地址