发明名称 |
FABRICATION OF MICROSTRUCTURES AND NANOSTRUCTURES USING ETCHING RESIST |
摘要 |
Nanostructures and microstructures are formed by patterning methods such as Dip Pen Nanolithography (DPN) or microcontact printing of organic molecules functioning as a resist on a substrate followed by an etching step. The etch resist is a patterning composition and can contain on a substrate including polyethylene glycol (PEG). Positive and negative etch methods can be used. |
申请公布号 |
KR20090101943(A) |
申请公布日期 |
2009.09.29 |
申请号 |
KR20097015100 |
申请日期 |
2007.12.17 |
申请人 |
NORTHWESTERN UNIVERSITY |
发明人 |
MIRKIN CHAD A.;HUANG LING;SANEDRIN RAYMOND |
分类号 |
B82B3/00;G03F7/00 |
主分类号 |
B82B3/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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