MONITORING SUBSTRATE PROCESSING USING REFLECTED RADIATION,申请号KR20087015856-传众专利搜索

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发明名称	MONITORING SUBSTRATE PROCESSING USING REFLECTED RADIATION
摘要
申请公布号	KR100918932(B1)	申请公布日期	2009.09.28
申请号	KR20087015856	申请日期	2001.10.23
申请人		发明人
分类号	H01L21/00;H01L21/3065;G01N21/15;G01N21/21;G01N21/71;G01N21/95;H01J37/32;H01L21/02;H01L21/311;H01L21/316	主分类号	H01L21/00
代理机构		代理人
主权项
地址

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