发明名称 Device for introducing fluid in treatment chamber by chemical vapor deposition, includes fluid injector comprising body in one part and movable piece forming seal in other part, where body and/or seal has surface made of synthesis material
摘要 <p>The device comprises a fluid injector comprising a body (17) in one part and a movable piece forming a seal in other part. The body and/or the seal have a surface made of synthesis material in contact with a surface of other element. The synthesis material has a thickness of greater than 50 mu m, and comprises a polymer, a mineral load and ceramic. The seal is trained by an actuator. The ceramic has a Vickers hardness of greater than 1100 and a dynamic friction coefficient of lower than 0.16.</p>
申请公布号 FR2928937(A1) 申请公布日期 2009.09.25
申请号 FR20080001477 申请日期 2008.03.18
申请人 ALTATECH SEMICONDUCTOR 发明人 VITIELLO JULIEN;MONCHOIX HERVE
分类号 C23C16/448;C23C16/455 主分类号 C23C16/448
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