发明名称 VACUUM PROCESSING APPARATUS
摘要 PURPOSE: A vacuum processing device is provided to increase the sealing ability by preventing the leakage of the vacuum pressure by making a sealing member as enclosed type. CONSTITUTION: A vacuum processing device comprises a first chamber member(1), a plurality of second chamber members, a plurality of sealing members(30), and a gas supply part. The first chamber member forms a polyhedron. The first chamber member has an opening(1A) at the surfaces more than two. The second chamber member forms a vacuum break space in which a substrate is vacuumized by the closing and opening the first chamber member. The sealing member is interposed between the first and second chamber members in order to seal the vacuum break space. The gas supply part vacuumizes the substrate.
申请公布号 KR20090101010(A) 申请公布日期 2009.09.24
申请号 KR20080026601 申请日期 2008.03.21
申请人 INTEGRATED PROCESS SYSTEMS LTD. 发明人 CHO, SAENG HYUN;AHN, SUNG IL
分类号 B65G5/00;G02F1/13 主分类号 B65G5/00
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