| 摘要 |
PROBLEM TO BE SOLVED: To provide a manufacturing method of a sound wave generation device which can be formed so as to have a large area and to be inexpensive by deposition using application without limiting a substrate to silicon. SOLUTION: A fluid material including precursors which form nanocrystalline particles and heating elements are applied and deposited on a substrate, and after drying and heating, the sound wave generation device which emits ultrasonic waves is formed by photo-irradiation. COPYRIGHT: (C)2009,JPO&INPIT
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