| 摘要 |
PROBLEM TO BE SOLVED: To provide a dry cleaning method which does not adversely affect a substrate by heat, efficiently heats the substrate for dry-cleaning a surface of the substrate and does not cause a problem on an apparatus. SOLUTION: The dry cleaning method for mounting the substrate on a mounting base provided in a treatment chamber can vacuum extraction and dry-cleaning the surface of the substrate includes a step of introducing a cleaning gas into the treatment chamber and adsorbing the gas onto the substrate, and a step, after the adsorption of the cleaning gas onto the substrate, introducing an energy medium gas having thermal energy applied into the treatment chamber, supplying the thermal energy to the cleaning gas on the substrate from the energy medium gas and conducting cleaning reaction on the surface of the substrate. COPYRIGHT: (C)2009,JPO&INPIT
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