ELECTRON BEAM WRITING METHOD, FINE PATTERN DRAWING SYSTEM, METHOD OF MANUFACTURING UNEVEN PATTERN CARRIER, AND METHOD FOR MANUFACTURING MAGNETIC DISK MEDIUM

摘要

PROBLEM TO BE SOLVED: To precisely and speedily draw fine patterns to be formed on a magnetic disk medium on the whole surface of a substrate with a constant amount of radiation exposure to the whole substrate while precisely ON/OFF controlling electron beam radiation in the circumferential direction. SOLUTION: When electron beams EB are scanned on a substrate 10 which is applied with a resist 11 to draw the shapes of elements 13 of fine patterns 12, the electron beams are radiated on the basis of drawing data according to an ON signal, at a prescribed position at which the substrate 10 rotates, and the shapes are drawn in the rotational direction according to the rotation. After drawing by one turn is performed under ON/OFF control which stops drawing at an OFF signal, the beam radiating position is moved in the radius direction to repeat the drawing under ON/OFF control. In this case, the rotational speed of the substrate 10 is controlled so as to be increased in inner track drawing and reduced in outer track drawing in inverse proportion to the radius of a drawing position. COPYRIGHT: (C)2009,JPO&INPIT