| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a polishing pad excellent in durability and having small pad waste generated at polishing. <P>SOLUTION: In the polishing pad provided with a polishing layer on a substrate layer, the polishing layer comprises a thermosetting polyurethane foam having approximately spherical open cells and is self-adhered to the substrate layer. The thermosetting polyurethane foam is a reaction cured substance of a urethane composition containing an isocyanate component and an active hydrogen-containing compound, and the urethane composition contains 5-20 wt.% of a large amount of diisocyanate. <P>COPYRIGHT: (C)2009,JPO&INPIT |
