| 摘要 |
PROBLEM TO BE SOLVED: To provide a simple thin film forming method which can simultaneously form a plurality of layers. SOLUTION: The method includes: preparing a first evaporating source 22 that evaporates a first evaporating source material onto a first deposition region and a second evaporating source 23 that evaporates a second evaporating source material onto a second deposition region, wherein the first and second evaporating source materials are different from each other; adjusting the first evaporating source 22 and the second evaporating source 23 in order to obtain a first overlapping region in which the first deposition region and the second deposition region overlap each other; driving the first evaporating source 22 and the second evaporating source 23 to deposit the first evaporating source material and the second evaporating source material onto a portion of an object to be processed; and moving the first evaporating source 22 and the second evaporating source 23 from the one end of the object to the other end of the object in such a manner that a first evaporating region obtained by deducing the first overlapping region from the first deposition region, the first overlapping region and a second evaporating region obtained by deducting the first overlapping region from the second deposition region are passed through in this order through the one end of the object. COPYRIGHT: (C)2009,JPO&INPIT
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