| 摘要 |
PROBLEM TO BE SOLVED: To form a thin film which is thin and low in reactivity, on an electron beam aperture of a sample holder for an electron microscope. SOLUTION: Disclosed are a thin film forming method including a step S12 of cooling a substrate where a BN film is to be formed, and a step S14 of forming an amorphous BN film on the substrate by using the sputtering method, a sample holder for an electron microscope using the thin film, and its forming method. According to the invention, the amorphous BN film is uniformly formed, and the BN film of low reactivity is formed thin. COPYRIGHT: (C)2009,JPO&INPIT
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