VACUUM PROCESSING APPARATUS

摘要

The present invention relates to a vacuum processing apparatus, more particularly to a vacuum processing apparatus which performs vacuum processes such as etching and deposition for a substrate of glass for an LCD panel, etc. The disclosed vacuum processing apparatus includes: a detachable cover which is attached to at least a part of an inner side of a vacuum chamber; and/or a detachable shielding member which is installed between a lateral side of a substrate support and the inner side of the vacuum chamber to shield a space therebetween. A coating layer containing at least one of W, Ni, W-N, Cr and Mo is formed on the surfaces of the cover and shielding member.